conference research / Tier b
ECSJ Meeting学会研究
Electrochemistry and materials-device research covering electronic materials, nano-functional devices, wet process and interconnect surface stability, CMP before hybrid bonding, Ru/graphene caps, porous silicon, GaAs and oxide formation, plating and electroless deposition, battery/electrode materials, sensors, and micro-nano fabrication. Relevant to semiconductor materials, FEOL/BEOL wet process, advanced packaging, device materials, and process characterization.
電気化学会大会 / Electrochemical Society of Japan Meetingは、ロジック / デバイス / プロセス統合の観点から ECSJ Meeting, electronic materials and nano-functional devices, micro-nano structure materials, device formation nano process, hybrid bonding CMP, porous silicon, GaAs, TSV-like plating, first-listed affiliation sample, official company exhibition rows, PR poster rows, banner advertiser rows, and ECSJ convention archive を確認するための学会です。公式ページ、募集要項、program、proceedings を分けて確認し、研究室DBや求人DBの分類軸へ接続します。
reader evaluation
この学会をどう見るか
産業動向への有用性を先に、国際性とシリーズの継続性を別の軸で確認します。
snapshot
基本データ
3大国際会議以外の主要学会として、分野別に確認する。
研究室DBと技術レーダーのfield接続に使う。
FEOL、BEOL、3DI、回路、WBG、フォトニクス、信頼性へ接続する。
2026 cycle finished / official ECSJ Confit summary, executive committee, S14 micro-nano device formation sessions, S19 electronic materials and nano-functional devices sessions, company project listing, and official convention archive checked
source signal dashboard
歴史と組織構成のダッシュボード
topics
研究テーマと企業調査へ変換する
coverage
Electrochemistry and materials-device research covering electronic materials, nano-functional devices, wet process and interconnect surface stability, CMP before hybrid bonding, Ru/graphene caps, porous silicon, GaAs and oxide formation, plating and electroless deposition, battery/electrode materials, sensors, and micro-nano fabrication. Relevant to semiconductor materials, FEOL/BEOL wet process, advanced packaging, device materials, and process characterization.
監視テーマ
ECSJ Meeting, electronic materials and nano-functional devices, micro-nano structure materials, device formation nano process, hybrid bonding CMP, porous silicon, GaAs, TSV-like plating, first-listed affiliation sample, official company exhibition rows, PR poster rows, banner advertiser rows, and ECSJ convention archive
CFPから抽出する論点
Official ECSJ/Confit sources identify the March 17-19, 2026 Tokyo University of Science Noda cycle, presentation registration deadline, abstract manuscript period, executive committee list, public session pages for micro-nano device formation and electronic materials/nano-functional devices, company exhibition/PR/banner listing rows, and official convention archive evidence.
年次比較で残す比較軸
Official ECSJ convention archive lists the 93rd Meeting in 2026 and traces the numbered meeting series to the first meeting in 1933. The DAC-style graph stores firstHeldYear=1933 and current-cycle evidence in PostgreSQL researchVisualSignals.
deadlines
投稿・採択イベント
2026 cycle finished / official ECSJ Confit summary, executive committee, S14 micro-nano device formation sessions, S19 electronic materials and nano-functional devices sessions, company project listing, and official convention archive checked
2026 cycle finished / official ECSJ Confit summary, executive committee, S14 micro-nano device formation sessions, S19 electronic materials and nano-functional devices sessions, company project listing, and official convention archive checked
related pages
関連ページ
研究室DBの学会発表実績タグは、公式業績・program・researchmap/KAKEN成果などで実際の発表が確認できた場合だけ表示します。候補・近接テーマだけでは接続しません。
sources
公式確認リンク
- 公式 公式ページ 確認日: 2026-07-07
- 募集要項 募集要項 / CFP 確認日: 2026-07-07
- program program 確認日: 2026-07-07
- proceedings proceedings 確認日: 2026-07-07