半導体製造ラボ

conference research / Tier b

JSPE Spring Meeting学会研究

Precision engineering and manufacturing research covering micro/nano machining, CMP and planarization, precision positioning, metrology, optical/X-ray measurement, laser processing, surface nanostructures, automation, and semiconductor manufacturing equipment development. Relevant to semiconductor process control, wafer processing, inspection/metrology, and production-equipment research.

2026年度精密工学会春季大会学術講演会 / JSPE Spring Meetingは、露光 / パターニング / 配線 / 量産の観点から JSPE Spring Meeting, precision engineering, micro/nano machining, CMP and planarization, precision positioning, metrology, semiconductor manufacturing equipment symposium, official program PDF presenter-affiliation extract, official equipment exhibitor rows, catalog exhibitor rows, and banner advertiser rows を確認するための学会です。公式ページ、募集要項、program、proceedings を分けて確認し、研究室DBや求人DBの分類軸へ接続します。

snapshot

基本データ

Tier B

3大国際会議以外の主要学会として、分野別に確認する。

分野 露光 / パターニング / 配線 / 量産

研究室DBと技術レーダーのfield接続に使う。

ジャンル FEOL / デバイス / BEOL / 配線・製造 / 信頼性 / メモリ

FEOL、BEOL、3DI、回路、WBG、フォトニクス、信頼性へ接続する。

主催 The Japan Society for Precision Engineering
開催サイクル 2026-03-17 to 2026-03-19 / Saitama University Main Campus, Saitama, Japan

2026 cycle finished / official JSPE Spring home, executive committee list, program PDF, event page with 447 talks, equipment/catalog exhibitor listing, banner advertiser rows, and semiconductor manufacturing symposium checked

投稿形式 Official JSPE 2026 Spring sources identify presentation application, PDF manuscript/proceedings submission, a public program PDF, and a completed March 2026 academic meeting. Reviewed graph data is hydrated from PostgreSQL researchVisualSignals.

topics

研究テーマと企業調査へ変換する

coverage

Precision engineering and manufacturing research covering micro/nano machining, CMP and planarization, precision positioning, metrology, optical/X-ray measurement, laser processing, surface nanostructures, automation, and semiconductor manufacturing equipment development. Relevant to semiconductor process control, wafer processing, inspection/metrology, and production-equipment research.

監視テーマ

JSPE Spring Meeting, precision engineering, micro/nano machining, CMP and planarization, precision positioning, metrology, semiconductor manufacturing equipment symposium, official program PDF presenter-affiliation extract, official equipment exhibitor rows, catalog exhibitor rows, and banner advertiser rows

CFPから抽出する論点

Official JSPE 2026 Spring sources identify the March 17-19, 2026 Saitama University cycle, presentation application deadline, program PDF, event-page talk count, executive committee list, equipment/catalog exhibitor listing, website banner advertiser rows, and semiconductor manufacturing technology symposium context.

年次比較で残す比較軸

Official JSPE pages identify the 2026 Spring Meeting cycle and the event page reports 447 talks. The DAC-style graph records current-cycle and source evidence in PostgreSQL researchVisualSignals without inferring a first-held year.

deadlines

投稿・採択イベント

要旨締切 2025-12-08

2026 cycle finished / official JSPE Spring home, executive committee list, program PDF, event page with 447 talks, equipment/catalog exhibitor listing, banner advertiser rows, and semiconductor manufacturing symposium checked

最終原稿締切 2026-01-19

2026 cycle finished / official JSPE Spring home, executive committee list, program PDF, event page with 447 talks, equipment/catalog exhibitor listing, banner advertiser rows, and semiconductor manufacturing symposium checked

related pages

関連ページ

研究室DBの学会発表実績タグは、公式業績・program・researchmap/KAKEN成果などで実際の発表が確認できた場合だけ表示します。候補・近接テーマだけでは接続しません。

sources

公式確認リンク