半導体製造ラボ

conference research / Tier b

Colloid 75学会研究

Colloid and interface chemistry, surfactants, emulsions, dispersions, nanoparticles, membranes, surface forces, soft matter, rheology, biointerfaces, cosmetics/materials chemistry, surface analysis, analytical instruments, and interface-control themes relevant to semiconductor wet process chemicals, slurry/dispersion control, coating, packaging, and materials characterization.

コロイドおよび界面化学討論会 / Colloid and Interface Chemistry Discussion Meetingは、ロジック / デバイス / プロセス統合の観点から コロイドおよび界面化学討論会, Colloid and Interface Chemistry Discussion Meeting, surfactants, colloids, dispersions, interface analysis, rheology, membranes, slurry, coating, wet processing, Kao, Lion, Anton Paar Japan, Otsuka Electronics, Kyowa Interface Science, Sanyo Trading, TA Instruments Japan, HORIBA, LUM Japan, Photonic Lattice, NIMS, AIST, Tohoku University, Tokyo University of Science, and official Confit first-listed affiliation rows を確認するための学会です。公式ページ、募集要項、program、proceedings を分けて確認し、研究室DBや求人DBの分類軸へ接続します。

snapshot

基本データ

Tier B

3大国際会議以外の主要学会として、分野別に確認する。

分野 ロジック / デバイス / プロセス統合

研究室DBと技術レーダーのfield接続に使う。

ジャンル FEOL / デバイス / BEOL / 配線・製造 / フォトニクス

FEOL、BEOL、3DI、回路、WBG、フォトニクス、信頼性へ接続する。

主催 公益社団法人 日本化学会 コロイドおよび界面化学部会
開催サイクル 2024-09-17 to 2024-09-20 / Tohoku University Kawauchi-kita Campus and Aoba-no-Kaze Terrace, Sendai, Japan

2024 cycle finished / official Confit home, committee, registration, public search/program, timetable, sponsor-company, exhibitor, host/co-host/support source checked

投稿形式 Official Confit registration guidance identifies oral and poster presentation application, abstract manuscript upload deadlines, program publication, and public Confit search/program rows. Reviewed graph data is hydrated from PostgreSQL researchVisualSignals.

topics

研究テーマと企業調査へ変換する

coverage

Colloid and interface chemistry, surfactants, emulsions, dispersions, nanoparticles, membranes, surface forces, soft matter, rheology, biointerfaces, cosmetics/materials chemistry, surface analysis, analytical instruments, and interface-control themes relevant to semiconductor wet process chemicals, slurry/dispersion control, coating, packaging, and materials characterization.

監視テーマ

コロイドおよび界面化学討論会, Colloid and Interface Chemistry Discussion Meeting, surfactants, colloids, dispersions, interface analysis, rheology, membranes, slurry, coating, wet processing, Kao, Lion, Anton Paar Japan, Otsuka Electronics, Kyowa Interface Science, Sanyo Trading, TA Instruments Japan, HORIBA, LUM Japan, Photonic Lattice, NIMS, AIST, Tohoku University, Tokyo University of Science, and official Confit first-listed affiliation rows

CFPから抽出する論点

Official 2024 Confit sources identify the September 17-20, 2024 Sendai cycle, oral abstract deadline extended to June 17, 2024, poster abstract deadline June 28, 2024, organizing and executive committee tables, public search/program rows, sponsor-company page, exhibitor pages, and host/co-host/support society listings. Reviewed graph data is hydrated from PostgreSQL researchVisualSignals.

年次比較で残す比較軸

Official Confit home identifies the current event as 第75回コロイドおよび界面化学討論会. The DAC-style graph stores currentEdition=75 and current-cycle evidence in PostgreSQL researchVisualSignals without backcasting a first-held year.

deadlines

投稿・採択イベント

要旨締切 2024-06-17

2024 cycle finished / official Confit home, committee, registration, public search/program, timetable, sponsor-company, exhibitor, host/co-host/support source checked

最終原稿締切 2024-06-28

2024 cycle finished / official Confit home, committee, registration, public search/program, timetable, sponsor-company, exhibitor, host/co-host/support source checked

related pages

関連ページ

締切一覧で全体比較 研究室DBで発表実績タグを確認 学会記事トレンド 技術レーダー

研究室DBの学会発表実績タグは、公式業績・program・researchmap/KAKEN成果などで実際の発表が確認できた場合だけ表示します。候補・近接テーマだけでは接続しません。

sources

公式確認リンク