半導体製造ラボ SEMICONDUCTOR DATA LAB

ISPlasma学会研究

International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterialsは、ISPlasma / IC-PLANTS Committeeが主催するパワー半導体 / Wide-Bandgap分野の学会です。

主な対象

nitride semiconductors、wide band gap semiconductors、plasma processing、nanomaterials、bio applicationsを同じ場で確認できる。

確認日
2026-08-13
開催サイクル
2027-03-02〜2027-03-06 / Nagoya University (Higashiyama Campus), Nagoya, Japan

reader evaluation

この学会をどう見るか

Position Tier

Tier B

確立した専門・地域学会です。

なぜこの評価？
公式根拠 www2025programcommitteesponsorswww2025
評価方法を見る

snapshot

基本データ

ジャンル WBG / パワー
投稿形式 online abstract submission + late news PDF abstract + oral/poster program + proceedings download

source signal dashboard

歴史と組織構成のダッシュボード

history

Archive from 2009

初回開催年 2009年（推定） / 17年 / 公式確認

根拠初回開催年

history source

企業 / 大学 / 研究機関比率

ISPlasma 2025 official committee affiliation rows

122 official Advisory / Organizing / Program committee person-role rows / 公式source抽出 / spot QA済

89.3% University

  • Company 4.9%
  • University 89.3%
  • Research institute 5.7%

Rows use the official Committee tables. Committee geography is not exposed as a public country/region breakdown.

source

ISPlasma 2025 public program speaker affiliation organization rows

28 official public program speaker affiliation organization rows / 公式source抽出 / spot QA済

71.4% University

  • Company 10.7%
  • University 71.4%
  • Research institute 17.9%

Rows use official public plenary/keynote/invited/topical speaker pages because the full Confit program and proceedings were not machine-readable public sources. Program country/region is affiliation organization country/region.

source

会社別内訳

ISPlasma 2025 committee company rows

6 company rows / 122 official committee rows / 公式source抽出 / spot QA済

  1. Kioxia Corporation 2
  2. Austin Plasma Lab, Tokyo Electron America Inc. 1
  3. Sony Semiconductor Solutions Corporation 1
  4. Tokyo Electron Miyagi, Ltd. 1
  5. TOKYO ELECTRON TECHNOLOGY SOLUTIONS LIMITED 1

Company rows are official committee person-role rows, not de-duplicated headcount.

source

ISPlasma 2025 public program speaker affiliation company rows

3 company rows / 28 official public program speaker affiliation organization rows / 公式source抽出 / spot QA済

  1. Air Liquide 1
  2. Photo electron Soul Inc. 1
  3. TOKYO ELECTRON 1

Company rows are official public program speaker affiliation organization rows, not full accepted-presentation rows.

source

所属機関の国・地域別内訳

ISPlasma 2025 public program speaker affiliation organization countries / regions

28 official public program speaker affiliation organization rows / 公式source抽出 / spot QA済

  1. Japan 20 71.4%
  2. Germany 2 7.1%
  3. Taiwan 2 7.1%
  4. Denmark 1 3.6%
  5. Slovakia 1 3.6%
  6. United Kingdom 1 3.6%
  7. United States 1 3.6%

Country/region rows are affiliation organization country/region only. Unknown is retained where the official organization string did not support a conservative location assignment.

source

スポンサー

ISPlasma 2025 official sponsor/support listing mix

45 official sponsor/support/corporate listing rows / 公式source抽出 / spot QA済

35.6% Professional society

  • Company 31.1%
  • University 15.6%
  • Research institute 17.8%
  • Professional society 35.6%

Rows use the official Sponsors page. The sponsor donut and full sponsor list use the same rows.

source

ISPlasma 2025 official sponsor/support/corporate listing

45 official sponsor/support/corporate listing rows / 公式source抽出 / spot QA済

  • Sponsored by The Japan Society of Applied Physics Sponsored by / Professional society
  • Co-sponsored by Nagoya University Co-sponsored by / University
  • Co-sponsored by Chubu University Co-sponsored by / University
  • Co-sponsored by Meijo University Co-sponsored by / University
  • Co-sponsored by Nagoya Institute of Technology Co-sponsored by / University
  • Co-sponsored by The Japan Society of Plasma Science and Nuclear Fusion Research Co-sponsored by / Professional society
  • Co-sponsored by The Japanese Association for Crystal Growth Co-sponsored by / Professional society
  • Supported by Aichi Industrial Research Association Supported by / Professional society
  • Supported by Aichi Science & Technology Foundation Supported by / Research institute
  • Supported by The Chemical Society of Supported by / Professional society
  • Supported by Chubu Region Institute for Social and Economic Research Supported by / Research institute
  • Supported by The Electrochemical Society of Supported by / Professional society
  • Supported by The Forum for Atomic and Molecular Data and Their Applications Supported by / Professional society
  • Supported by Gifu Industries' Association Supported by / Professional society
  • Supported by Gifu Economic and Industrial Promotion Center Supported by / Research institute
  • Supported by Gifu University Supported by / University
  • Supported by Greater Nagoya Initiative Center (GNIC) Supported by / Research institute
  • Supported by The Institute of Electrical Engineers of Supported by / Professional society
  • Supported by The Institute of Electronics, Information and Communication Engineers Supported by / Professional society
  • Supported by Japan Fine Ceramics Center Supported by / Research institute
  • Supported by Japan Society of Electromagnetic Wave Energy Applications Supported by / Professional society
  • Supported by The Japan Society of Mechanical Engineers Supported by / Professional society
  • Supported by The Japan Society of Vacuum and Surface Science Supported by / Professional society
  • Supported by Mie University Supported by / University
  • Supported by Nagoya Chamber of Commerce & Industry Supported by / Professional society
  • Supported by Nagoya Industrial Science Research Institute Supported by / Research institute
  • Supported by Nagoya Industries Promotion Corporation Supported by / Research institute
  • Supported by National Institute of Natural Sceiences National Institute for Fusion Science Supported by / Research institute
  • Supported by The Society of Chemical Engineers Supported by / Professional society
  • Supported by The Surface Finishing Society of Supported by / Professional society
  • Supported by Toyohashi University of Technology Supported by / University
  • Corporate Sponsors NGK Insulators Corporate Sponsors / Company
  • Corporate Sponsors Shibaura Mechatronics Corporate Sponsors / Company
  • Corporate Sponsors HyBridge Corporate Sponsors / Company
  • Corporate Sponsors AGC Corporate Sponsors / Company
  • Corporate Sponsors Kioxia Corporation Corporate Sponsors / Company
  • Corporate Sponsors Hitachi High-Tech Corporate Sponsors / Company
  • Corporate Sponsors TECHNOPORT Corporate Sponsors / Company
  • Corporate Sponsors Tokyo Electron Corporate Sponsors / Company
  • Corporate Sponsors NTK Ceratec Corporate Sponsors / Company
  • Corporate Sponsors Ushio Inc. Corporate Sponsors / Company
  • Corporate Sponsors Fujikin Corporate Sponsors / Company
  • Corporate Sponsors HS Corporation Corporate Sponsors / Company
  • Corporate Sponsors Innovation Science Corporate Sponsors / Company
  • Corporate Sponsors Science Shokai Corporate Sponsors / Company

Rows enumerate official Sponsored by / Co-sponsored by / Supported by / Corporate Sponsors listings. Sponsor listing is not evidence of customer, procurement, hiring, revenue, or collaboration relationship.

source

topics

研究テーマと企業調査へ変換する

監視テーマ

nitride semiconductors, WBG, plasma processing, nanomaterials, topical sessions

CFPから抽出する論点

公式Important DatesとLate News Submissionでabstract / late news submission、公式Programでoral/poster sessionsとConfit finalized program導線を確認した。

年次比較で残す比較軸

公式2025 homeのPast ConferencesはISPlasma2009からのarchiveを示す。

deadlines

投稿・採択イベント

要旨締切 2026-09-30

related pages

関連ページ

締切一覧で全体比較研究室DBで発表実績タグを確認学会記事トレンド技術レーダー

sources

公式確認リンク

回答待ち 更新中 公開Q&A

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