SPIE Etch学会研究
SPIE Advanced Etch Technology and Process Integration for Nanopatterningは、SPIEが主催する露光 / パターニング / 配線 / 量産分野の学会です。
etch、pattern transfer、process integration、ALE、plasma process を lithography 後の形状転写として確認する。
- 確認日
- 2026-08-13
- 開催サイクル
- 2027-02-21〜2027-02-25 / San Jose, California, US
reader evaluation
この学会をどう見るか
Position Tier
Tier A
国際的に強い主要・専門学会です。
産業動向への有用性
強い
企業発表・委員会・スポンサーを分けて確認
研究の性格
産業動向中心
46 official presentation first-listed author affiliation organization rows / 46件
地理的な到達範囲
世界規模
発表者の所属機関国・地域 / 2026 / 参加範囲を示す軸で、学会の優劣とは別の指標です
snapshot
基本データ
source signal dashboard
歴史と組織構成のダッシュボード
history
Official 2026 SPIE guide labels the series XV; annual-series backcast begins in 2012
初回開催年 2012年（推定） / 14年 / 公式source抽出 / spot QA済
根拠annual count backcast from 15th volume
history source企業 / 大学 / 研究機関比率
SPIE ALP 2026 official Conference 13984 session-chair affiliation rows
61.1% Company
- Company 61.1%
- Research institute 38.9%
Rows use official Conference 13984 session-chair affiliation organization rows from the SPIE Advanced Lithography + Patterning 2026 event overview / exhibit guide because the guide does not expose a separate public program-committee affiliation roster. Geographic breakdown is intentionally omitted for this block.
sourceSPIE ALP 2026 official Conference 13984 presentation first-listed affiliation rows
50% Company
- Company 50%
- University 28.3%
- Research institute 21.7%
Rows count the first-listed author affiliation organization from each official Conference 13984 presentation block in the SPIE 2026 event overview / exhibit guide. Countries and regions use affiliation organization location only.
source会社別内訳
SPIE ALP 2026 Conference 13984 official session-chair company rows
- Canon 3
- Lam Research 2
- Hitachi High-Tech 1
- IBM 1
- Intel 1
- Samsung Electronics 1
- Synopsys 1
- Tokyo Electron 1
Company rows are official session-chair source rows, not de-duplicated headcount.
sourceSPIE ALP 2026 Conference 13984 official presentation company rows
- Lam Research 5
- AlixLabs 2
- Applied Materials 2
- Tokyo Electron 2
- Air Liquide 1
- Applied Angstrom Technology 1
- Canon 1
- Edwards Vacuum 1
- Hitachi 1
- HOYA 1
- IBM 1
- KLA 1
- SAMSUNG 1
- Samsung Electronics 1
- SandBox Semiconductor 1
- SCREEN Semiconductor Solutions 1
Company rows are first-listed author affiliation rows from the official SPIE event guide, not de-duplicated organization headcount.
source所属機関の国・地域別内訳
SPIE ALP 2026 Conference 13984 first-listed author affiliation organization countries / regions
- United States 15 32.6%
- Belgium 8 17.4%
- South Korea 8 17.4%
- Japan 4 8.7%
- France 2 4.3%
- Sweden 2 4.3%
- Austria 1 2.2%
- China 1 2.2%
- Germany 1 2.2%
- Greece 1 2.2%
- India 1 2.2%
- Netherlands 1 2.2%
- Singapore 1 2.2%
Countries and regions are based on first-listed author affiliation organizations in the official SPIE 2026 event overview / exhibit guide.
sourceスポンサー
SPIE ALP official sponsor and promotional partner listing mix
71.4% Company
- Company 71.4%
- Other / public / unknown 28.6%
Rows enumerate every official sponsor and promotional partner listing on the SPIE Advanced Lithography + Patterning sponsor page. The sponsor donut and sponsor list use the same listing rows.
sourceSPIE ALP official sponsor and promotional partner listings
- sponsor Applied Materials, Inc. sponsor / Company
- sponsor EMD Electronics sponsor / Company
- sponsor Pozzetta, Inc. sponsor / Company
- sponsor Qnity Electronics, Inc. sponsor / Company
- sponsor Synopsys, Inc. sponsor / Company
- promotional partner optics.org promotional_partner / Other
- promotional partner Semiconductor Digest promotional_partner / Other
Rows are the same official sponsor-page listing rows used by the sponsor mix donut.
sourcetopics
研究テーマと企業調査へ変換する
監視テーマ
etch, pattern transfer, ALE, plasma, process integration, profile control
CFPから抽出する論点
露光だけでは解けない寸法制御を etch と process integration の側で確認でき、装置/材料/量産DBの接続点になる。
年次比較で残す比較軸
ASML/TEL/Lam/Applied Materials などの装置企業研究ページへ、露光後工程の課題として接続しやすい。
deadlines
投稿・採択イベント
related pages
関連ページ
sources
公式確認リンク
- 公式 公式ページ 確認日: 2026-08-13