SPIE DTCO学会研究
SPIE DTCO and Computational Patterningは、SPIEが主催する露光 / パターニング / 配線 / 量産分野の学会です。
design-technology co-optimization、computational lithography、OPC、ILT、EPE を設計/製造境界で確認する。
- 確認日
- 2026-08-13
- 開催サイクル
- 2027-02-21〜2027-02-25 / San Jose, California, US
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基本データ
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歴史と組織構成のダッシュボード
history
Official 2026 SPIE guide labels the series V; annual-series backcast begins in 2022
初回開催年 2022年（推定） / 4年 / 公式source抽出 / spot QA済
根拠official 2026 title v annual backcast
history source企業 / 大学 / 研究機関比率
SPIE ALP 2026 Conference 13980 official chair, co-chair, and Program Committee affiliation rows
73.9% Company
- Company 73.9%
- University 13%
- Research institute 8.7%
- Other / public / unknown 4.3%
Rows use the official SPIE Advanced Lithography + Patterning 2026 event overview / exhibit guide for Conference 13980 chair, co-chair, and Program Committee affiliation organizations. Committee geography is intentionally not rendered.
sourceSPIE ALP 2026 Conference 13980 presentation first-listed affiliation rows
70.5% Company
- Company 70.5%
- University 16.4%
- Research institute 6.6%
- Other / public / unknown 6.6%
Rows count the first-listed author affiliation organization from each official Conference 13980 presentation block in the SPIE 2026 event overview / exhibit guide, including the official 13980 plenary row listed in the same guide. Countries and regions use affiliation organization location only.
source会社別内訳
SPIE ALP 2026 Conference 13980 official committee company rows
- Synopsys 3
- Intel 2
- KIOXIA 2
- Siemens EDA 2
- Cadence Design Systems 1
- GlobalFoundries 1
- IBM 1
- Lam Research 1
- MOSIS 1
- NVIDIA 1
- NXP Semiconductors 1
- Samsung Electronics 1
Company rows are official committee source rows, not de-duplicated headcount.
sourceSPIE ALP 2026 Conference 13980 official presentation company rows
- Siemens EDA 8
- Synopsys 6
- Intel 5
- Samsung Electronics 5
- GlobalFoundries 2
- Nanya Technology 2
- NVIDIA 2
- SemiAI 2
- ASML 1
- Cadence Design Systems 1
- Dongfang Jingyuan Electron 1
- Fastlitho 1
- KIOXIA 1
- Macronix 1
- POLLEN Metrology 1
- Powerchip Semiconductor Manufacturing 1
- Texas Instruments 1
- Tokyo Electron 1
- Winbond Electronics 1
Company rows are first-listed author affiliation rows from the official SPIE event guide, not de-duplicated organization headcount.
source所属機関の国・地域別内訳
SPIE ALP 2026 Conference 13980 first-listed author affiliation organization countries / regions
- United States 27 44.3%
- South Korea 11 18%
- Taiwan 8 13.1%
- Belgium 4 6.6%
- China 3 4.9%
- Japan 3 4.9%
- Egypt 2 3.3%
- France 1 1.6%
- Germany 1 1.6%
- India 1 1.6%
Countries and regions are based on first-listed author affiliation organizations in the official SPIE 2026 event overview / exhibit guide.
sourceスポンサー
SPIE ALP official sponsor and promotional partner listing mix
71.4% Company
- Company 71.4%
- Other / public / unknown 28.6%
Rows enumerate every official sponsor and promotional partner listing on the SPIE Advanced Lithography + Patterning sponsor page. The sponsor donut and sponsor list use the same listing rows.
sourceSPIE ALP official sponsor and promotional partner listings
- Sponsor Applied Materials, Inc. sponsor / Company
- Sponsor EMD Electronics sponsor / Company
- Sponsor Pozzetta, Inc. sponsor / Company
- Sponsor Qnity Electronics, Inc. sponsor / Company
- Sponsor Synopsys, Inc. sponsor / Company
- Promotional partner optics.org promotional_partner / Other
- Promotional partner Semiconductor Digest promotional_partner / Other
Rows are the same official sponsor-page listing rows used by the sponsor mix donut.
sourcetopics
研究テーマと企業調査へ変換する
監視テーマ
DTCO, computational patterning, OPC, ILT, EPE, AI for patterning
CFPから抽出する論点
設計側のルール変更と露光側の制約を同じ topic にまとめるため、EDA と量産 patterning の接続点を抽出しやすい。
年次比較で残す比較軸
DAC/ICCAD の設計自動化シグナルを、製造制約と歩留まりへ接続するときの補助線になる。
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投稿・採択イベント
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関連ページ
sources
公式確認リンク
- 公式 公式ページ 確認日: 2026-08-13