SPIE Materials学会研究
SPIE Advances in Patterning Materials and Processesは、SPIEが主催する露光 / パターニング / 配線 / 量産分野の学会です。
photoresist、underlayer、developer、stochastic defect、dry resist など、露光材料とプロセス窓を確認する。
- 確認日
- 2026-08-13
- 開催サイクル
- 2027-02-21〜2027-02-25 / San Jose, California, US
reader evaluation
この学会をどう見るか
Position Tier
Tier A
国際的に強い主要・専門学会です。
産業動向への有用性
強い
企業発表・委員会・スポンサーを分けて確認
研究の性格
産業動向中心
126 official presentation first-listed author affiliation organization rows / 126件
地理的な到達範囲
国際
発表者の所属機関国・地域 / 2026 / 参加範囲を示す軸で、学会の優劣とは別の指標です
snapshot
基本データ
source signal dashboard
歴史と組織構成のダッシュボード
history
Official 2026 SPIE guide labels the series XLIII; annual-series backcast begins in 1984
初回開催年 1984年（推定） / 42年 / 公式source抽出 / spot QA済
根拠official 2026 conference title xliii annual count backcast
history source企業 / 大学 / 研究機関比率
SPIE ALP 2026 Conference 13983 official chair, co-chair, and Program Committee affiliation rows
81.8% Company
- Company 81.8%
- Research institute 18.2%
Rows use the official SPIE Advanced Lithography + Patterning 2026 event overview / exhibit guide for Conference 13983 chair, co-chair, and Program Committee affiliation organizations. Committee geography is intentionally not rendered.
sourceSPIE ALP 2026 Conference 13983 presentation first-listed affiliation rows
65.1% Company
- Company 65.1%
- University 15.9%
- Research institute 19%
Rows count the first-listed author affiliation organization from each official Conference 13983 presentation block in the SPIE 2026 event overview / exhibit guide. Countries and regions use affiliation organization location only.
source会社別内訳
SPIE ALP 2026 Conference 13983 official committee company rows
- IBM 3
- Lam Research 3
- Intel 2
- Air Liquide Electronics 1
- Canon Nanotechnologies 1
- Hitachi High-Tech 1
- KLA 1
- Meta 1
- NAURA 1
- Samsung Electronics 1
- Siemens EDA 1
- Synopsys 1
- Tokyo Electron 1
Company rows are official committee source rows, not de-duplicated headcount.
sourceSPIE ALP 2026 Conference 13983 official presentation company rows
- Tokyo Electron 13
- DuPont Electronics 7
- EMD Electronics 7
- Samsung Electronics 6
- IBM 5
- ASML 4
- Brewer Science 4
- Entegris 4
- FUJIFILM 4
- Toyo Gosei 4
- Geminatio 3
- Inpria 3
- Qnity Electronics 3
- Pall 2
- Applied Materials 1
- Canon Nanotechnologies 1
- Eastman Chemical 1
- EV Group E. Thallner GmbH 1
- Hangzhou Cobetter Filtration Equipment 1
- Irresistible Materials 1
- JSR 1
- KLA 1
- Mitsubishi Gas Chemical Co., Inc. 1
- Nissan Chemical Corp. 1
- SCREEN Semiconductor Solutions 1
- Siemens EDA 1
- Tokyo Univ of Technology 1
Company rows are first-listed author affiliation rows from the official SPIE event guide, not de-duplicated organization headcount.
source所属機関の国・地域別内訳
SPIE ALP 2026 Conference 13983 first-listed author affiliation organization countries / regions
- United States 65 51.6%
- Japan 32 25.4%
- South Korea 10 7.9%
- Belgium 6 4.8%
- Netherlands 3 2.4%
- China 2 1.6%
- Austria 1 0.8%
- Canada 1 0.8%
- Germany 1 0.8%
- India 1 0.8%
- Italy 1 0.8%
- Switzerland 1 0.8%
- Taiwan 1 0.8%
- United Kingdom 1 0.8%
Countries and regions are based on first-listed author affiliation organizations in the official SPIE 2026 event overview / exhibit guide.
sourceスポンサー
SPIE ALP official sponsor and promotional partner listing mix
71.4% Company
- Company 71.4%
- Other / public / unknown 28.6%
Rows enumerate every official sponsor and promotional partner listing on the SPIE Advanced Lithography + Patterning sponsor page. The sponsor donut and sponsor list use the same listing rows.
sourceSPIE ALP official sponsor and promotional partner listings
- Official sponsor Applied Materials, Inc. sponsor / Company
- Official sponsor EMD Electronics sponsor / Company
- Official sponsor Pozzetta, Inc. sponsor / Company
- Official sponsor Qnity Electronics, Inc. sponsor / Company
- Official sponsor Synopsys, Inc. sponsor / Company
- Official promotional partner optics.org promotional_partner / Other
- Official promotional partner Semiconductor Digest promotional_partner / Other
Rows are the same official sponsor-page listing rows used by the sponsor mix donut.
sourcetopics
研究テーマと企業調査へ変換する
監視テーマ
resist, underlayer, dry resist, stochastic defect, process window, sustainability
CFPから抽出する論点
材料企業、露光装置、計測、etch の間に出るボトルネックを材料側から分解できる。
年次比較で残す比較軸
材料メーカーの企業研究ページや求人DBで、レジスト/前処理/洗浄/分析の職種接続を作るときに使う。
deadlines
投稿・採択イベント
related pages
関連ページ
sources
公式確認リンク
- 公式 公式ページ 確認日: 2026-08-13